DocumentCode :
2042274
Title :
Work function based field effect devices for gas sensing
Author :
Eisele, I. ; Burgmair, M.
Author_Institution :
Inst. of Phys., Univ. der Bundeswehr Munchen, Neubiberg, Germany
fYear :
2000
fDate :
2000
Firstpage :
285
Lastpage :
291
Abstract :
In comparison to state of the art microsensors for gas detection, which are mainly based on conductivity measurements, field effect devices exploiting the gas induced shift of a material´s work function exhibit several superior features: Low power consumption and sensitivity to a wider range of adsorption mechanisms. A hybrid suspended design of the transistor gate, whose air gap permits the access of gas species to the inner surfaces, enables the incorporation of almost all groups of sensitive materials. The topic of this work is to report about design requirements concerning the silicon device structure, the hybrid gate and the mounting techniques.
Keywords :
MISFET; adsorption; air gaps; gas sensors; microsensors; work function; Si; adsorption; gas sensor; hybrid suspended gate field effect transistor; metal air-gap insulator semiconductor structure; microsensor; mounting technique; silicon device; work function; Capacitance; Chemical sensors; Conductivity measurement; Energy consumption; Energy measurement; FETs; Insulation; Metal-insulator structures; Microsensors; Temperature sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2000. COMMAD 2000. Proceedings Conference on
Print_ISBN :
0-7803-6698-0
Type :
conf
DOI :
10.1109/COMMAD.2000.1022944
Filename :
1022944
Link To Document :
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