Title :
Characteristics of a wire ion plasma source and a secondary emission electron gun
Author :
Hotta, E. ; Osawa, Takeshi ; Urai, H. ; Suzuki, M. ; Yasui, Hirotomo ; Tamagawa, T.
Author_Institution :
Tokyo Inst. of Technol., Japan
Abstract :
Summary form only given. The electrical characteristics of a wire ion plasma source (WIPS) and a secondary emission electron gun for which the WIPS is used as an ion source are reported. The WIPS is a cold-cathode discharge device, in which a radial electron trapping permits an extremely low pressure gas discharge with very low applied voltages. The time evolutions of the temperature and density of the afterglow plasma were measured with a double probe. The ion current density measured by a biased ion collector (BIC) on the discharge tube wall was found to reach 300 mA/cm/sup 2/. A secondary emission electron gun was set on the discharge tube wall opposite to the BIC. The electron beam current was measured by the BIC. At a cathode voltage of -30 kV, the measured beam current density was 220 mA/cm/sup 2/.
Keywords :
plasma production; -30 kV; afterglow plasma; biased ion collector; cold-cathode discharge device; density; discharge tube wall; double probe; electrical characteristics; electron beam current; ion current density; ion source; low pressure gas discharge; radial electron trapping; secondary emission electron gun; temperature; time evolutions; wire ion plasma source; Current density; Current measurement; Density measurement; Electric variables; Electron emission; Electron tubes; Plasma measurements; Plasma sources; Plasma temperature; Wire;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.594194
