DocumentCode
2043467
Title
Low-temperature bonding method based on metallic microcone array for interconnection application
Author
Qin Lu ; Zhuo Chen ; Liming Gao ; Ming Li
Author_Institution
Sch. of Mater. Sci. & Eng., Shanghai Jiao Tong Univ., Shanghai, China
fYear
2012
fDate
13-16 Dec. 2012
Firstpage
1
Lastpage
4
Abstract
Stacked bonding has become one of the key technologies of 3D IC. This paper reports a low-temperature solid state bonding method based on metallic microcone array for potential use in 3D integration applications. Sn-3.0Ag-0.5Cu solder balls with 760 μm diameter were used for the low-temperature BGA bonding. Ni micro cone layer was prepared by electro deposition and Cu micro cone layer was deposited by electroless plating, respectively. Bonding joints were shear tested to evaluate the joint strength of samples bonded at each pressure and temperature. Microscopic observation showed sufficient insertion between Sn and cone-structured Ni or Cu. Results showed that bonding strength was superior with proper bonding conditions.
Keywords
ball grid arrays; copper alloys; electroplating; integrated circuit bonding; integrated circuit interconnections; low-temperature techniques; silver alloys; three-dimensional integrated circuits; tin alloys; 3D IC; 3D integration applications; Sn-Ag-Cu; bonding joints; bonding strength; electroless plating; interconnection application; low-temperature BGA bonding; low-temperature bonding method; low-temperature solid state bonding method; metallic microcone array; microcone layer; microscopic observation; shear testing; size 760 mum; solder balls; stacked bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Materials and Packaging (EMAP), 2012 14th International Conference on
Conference_Location
Lantau Island
Print_ISBN
978-1-4673-4945-1
Electronic_ISBN
978-1-4673-4943-7
Type
conf
DOI
10.1109/EMAP.2012.6507901
Filename
6507901
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