Title :
Growth and field emission properties of carbon nanotubes on glass substrate of Ni catalyst layer using PECVD
Author :
Xin, Li ; Wang Van ; Weihua, Liu ; Changchun, Zhu
Author_Institution :
Sch. of Electron. & Inf. Eng., Xi´´an Jiaotong Univ.
Abstract :
The effects of NH3 on the growth characteristics of carbon nanotubes (CNTs) were systematically investigated in plasma enhanced chemical vapor deposition (PECVD) with C2H2 as a carbon source. The well aligned CNTs were grown from the Ni nanoparticles by plasma-enhanced chemical vapor deposition (PECVD). CNT films were formed with uniform surface morphology instead of nanotube-features. High-resolution transmission electron microscopy revealed that nanotubes grow from the boot with high adhesive ability. The lowest suitable growth temperature is around 560degC. The threshold field is smaller than 2 v/mum, the current within linear extend is from 200 to 700 mA. The luminescence of the CNTs film is not uniform, which resulted from the reduction of field screening effect
Keywords :
carbon nanotubes; catalysis; electron field emission; nanotechnology; photoluminescence; plasma CVD; surface morphology; transmission electron microscopy; 200 to 700 mA; C; Ni catalyst layer; PECVD; SiO2; adhesive ability; carbon nanotubes; field emission properties; field screening effect; glass substrate; high-resolution transmission electron microscopy; luminescence; plasma enhanced chemical vapor deposition; uniform surface morphology; Carbon nanotubes; Chemical vapor deposition; Glass; Nanoparticles; Plasma chemistry; Plasma properties; Plasma sources; Plasma temperature; Substrates; Surface morphology;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location :
Guilin
Print_ISBN :
1-4244-0401-0
DOI :
10.1109/IVNC.2006.335479
