• DocumentCode
    2044059
  • Title

    Increase of breakdown strength by morphological improvement at semicon interfaces in XLPE power cables and joints

  • Author

    Okamoto, T. ; Suzuki, H. ; Uchida, K. ; Tanaka, T. ; Inami, M. ; Sinagawa, J.

  • Author_Institution
    Central Res. Inst. of Electr. Power Ind., Yokosuka, Japan
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    109
  • Lastpage
    114
  • Abstract
    A new method to improve the breakdown strength at a semicon-interface in XLPE power cables and mould-type cable joints was developed. The method was named “Interface Diffusion Method” and is based on the modification of the semicon-layer material with an additive. It was determined that the additive improves the morphology in the XLPE insulation, the lamellar orientation at the interface and forms a diffusion layer near the interface. The modification results in the increase of the breakdown strength at the interface. The method was applied to XLPE power cables and joint model specimens with insulation thickness up to 9 mm. The specimens passed a voltage endurance test as 154 kV cable system components. This paper describes the breakdown strength and the material change (morphological change) of XLPE insulation at the interface in the specimens. The material change was analyzed with a transmission electron microscope (TEM)
  • Keywords
    XLPE insulation; cable jointing; electric breakdown; power cable insulation; 154 kV; XLPE insulation; additive; breakdown strength; interface diffusion method; lamellar orientation; mould-type cable joint; polymer morphology; power cable; semiconductor material; transmission electron microscopy; Additives; Breakdown voltage; Cable insulation; Crystalline materials; Crystallization; Electric breakdown; Morphology; Power cables; Power system modeling; Raw materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Insulation, 2000. Conference Record of the 2000 IEEE International Symposium on
  • Conference_Location
    Anaheim, CA
  • ISSN
    1089-084X
  • Print_ISBN
    0-7803-5931-3
  • Type

    conf

  • DOI
    10.1109/ELINSL.2000.845458
  • Filename
    845458