DocumentCode
2044482
Title
Active shielding suitable for electron beam lithography systems
Author
Yamazaki, Kinya ; Kato, K. ; Ashiho, K. ; Uda, T. ; Fujiwara, K. ; Takahashi, N. ; Haga, A. ; Satoh, T. ; Uegaki, J. ; Sakuma, Y.
Author_Institution
Takenaka Corp., Chiba, Japan
fYear
2003
fDate
March 30 2003-April 3 2003
Abstract
In this paper, experimental investigations using a model of the EBLS and 3-D magnetic field computations were carried out to find out the optimal position of an reference sensor outside the EBLS that can attenuate the magnetic disturbances inside the EBLS effectively and the degree of disturbance of the EB.
Keywords
electron beam lithography; magnetic noise; magnetic permeability; magnetic shielding; 3D magnetic field computations; EBLS; active shielding; electron beam lithography; magnetic disturbances; sensor position; Carbon capture and storage; Electron beams; Frequency; Lithography; Low-frequency noise; Magnetic field measurement; Magnetic fields; Magnetic noise; Magnetic shielding; Noise cancellation;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7647-1
Type
conf
DOI
10.1109/INTMAG.2003.1230379
Filename
1230379
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