Title :
Active shielding suitable for electron beam lithography systems
Author :
Yamazaki, Kinya ; Kato, K. ; Ashiho, K. ; Uda, T. ; Fujiwara, K. ; Takahashi, N. ; Haga, A. ; Satoh, T. ; Uegaki, J. ; Sakuma, Y.
Author_Institution :
Takenaka Corp., Chiba, Japan
fDate :
March 30 2003-April 3 2003
Abstract :
In this paper, experimental investigations using a model of the EBLS and 3-D magnetic field computations were carried out to find out the optimal position of an reference sensor outside the EBLS that can attenuate the magnetic disturbances inside the EBLS effectively and the degree of disturbance of the EB.
Keywords :
electron beam lithography; magnetic noise; magnetic permeability; magnetic shielding; 3D magnetic field computations; EBLS; active shielding; electron beam lithography; magnetic disturbances; sensor position; Carbon capture and storage; Electron beams; Frequency; Lithography; Low-frequency noise; Magnetic field measurement; Magnetic fields; Magnetic noise; Magnetic shielding; Noise cancellation;
Conference_Titel :
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7647-1
DOI :
10.1109/INTMAG.2003.1230379
