Title :
Thermal Model of Miniaturized Schottky Emitter for Parallel Electron Beam Lithography
Author :
Dokania, A.K. ; Velthuis, J.F.M. ; Zhang, Yanxia ; Kruit, Pieter
Author_Institution :
Charged Particle Opt., Delft Univ. of Technol.
Abstract :
This paper investigates the possibility of creating an array of Schottky emitters for use in parallel electron beam lithography. The Schottky source consists of a tiny single crystal W wire spot-welded on a heating filament for heating up to 1800 K. By designing the dimensions of the heating filament and choosing the best material, current etc, the emitter is optimized in a such a way that the temperature at the tip could be at 1800 K, without raising the temperature in surroundings significantly. In the proposed array design, 200 Schottky emitters will be arranged within the dimension of 30 times 30 mm and each beam from a source is further split into 100 beamlets
Keywords :
Schottky effect; field emitter arrays; tungsten; 1800 K; Schottky emitter array; Schottky source; W; heating filament; parallel electron beam lithography; single crystal wire; thermal model; Electron beams; Electron optics; Heating; Laboratories; Lithography; Moore´s Law; Stimulated emission; Temperature distribution; Thermal conductivity; Writing;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location :
Guilin
Print_ISBN :
1-4244-0401-0
DOI :
10.1109/IVNC.2006.335233