DocumentCode
2045821
Title
Controlling growth of aligned carbon nanotube bundles arrays with microwave plasma CVD
Author
Liu, J.B. ; Deng, S.Z. ; Xu, N.S. ; Chen, Jun ; Ke, Y.L.
Author_Institution
State Key Lab. of Optoelectron. Mater. & Technol., Zhongshan Univ., Guangzhou
fYear
2006
fDate
38899
Firstpage
493
Lastpage
494
Abstract
A method was employed to improve the growth condition of carbon nanotube (CNT) in microwave plasma CVD system. Plasma etching on silicon substrates was avoided effectively. CNT bundles arrays were synthesized and the CNTs were vertical to the substrate
Keywords
carbon nanotubes; nanotechnology; plasma CVD; C; Si; aligned carbon nanotube bundles arrays; chemical vapor deposition; growth condition; microwave plasma CVD; silicon substrates; Carbon nanotubes; Etching; Iron; Magnetic materials; Microwave antenna arrays; Photonic crystals; Plasma applications; Plasma materials processing; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location
Guilin
Print_ISBN
1-4244-0401-0
Type
conf
DOI
10.1109/IVNC.2006.335292
Filename
4134675
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