DocumentCode
2046306
Title
Advances in Specimen Preparation for Atom Probe Tomography
Author
Larson, D.J. ; Thompson, K. ; Lawrence, D. ; Kostrna, S.L.P. ; Prosa, T.J. ; Ulfig, R.M. ; Kelly, T.F.
Author_Institution
Imago Sci. Instrum. Corp., Madison, WI
fYear
2006
fDate
38899
Firstpage
537
Lastpage
538
Abstract
This paper presents several advances made in the areas of 1) automated electropolishing of metals, 2) specimen preparation for grain boundary analysis, 3) site-specific specimen preparation for semiconductor devices, and 4) low-energy focused ion beam (FIB) milling to reduce the extent of ion-induced damage during the generic FIB preparation process
Keywords
electrolytic polishing; focused ion beam technology; grain boundaries; ion beam effects; metals; milling; semiconductor devices; specimen preparation; tomography; atom probe tomography; electropolishing; grain boundary analysis; low-energy focused ion beam milling; metals; semiconductor devices; specimen preparation; Electrons; Focusing; Geometry; Grain boundaries; Instruments; Ion beams; Milling; Probes; Tomography; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location
Guilin
Print_ISBN
1-4244-0401-0
Type
conf
DOI
10.1109/IVNC.2006.335333
Filename
4134697
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