Title :
Investigation of the Site Occupation of Atoms in Pure and Doped TiA1/Ti3Al Intermetallic
Author :
Boll, Torben ; Al-Kassab, Talaat ; Yuan, Yong ; Liu, Zhi-guo
Author_Institution :
Inst. fuer Materialphys., Gottingen Univ.
Abstract :
Dual-phase TiAl/Ti3Al alloys consisting of a lamellar structure, comprising gamma-phase plus a small amount of alpha2 -phase, with addition of 1, 5 and 10 at.%Nb or 2 at.%Ag were prepared. The samples were investigated by means of the field ion microscopy (FIM), the tomographic atom probe (TAP) and supporting TEM, HRTEM analysis. The influence of doping elements on the variation of the field evaporation and microstructural parameters in the gamma-phase as studied by FIM and TAP will be reported in this contribution. A new algorithmic approach based on TAP results was developed to evaluate the site occupancies in such ordered structures. In addition, computer modelling and simulation of the field evaporation behaviour of the different species including the next neighbour interaction in a FIM specimen are performed for the first time
Keywords :
alloying additions; aluminium alloys; field evaporation; niobium alloys; probes; silver alloys; titanium alloys; transmission electron microscopy; TEM; Ti3AlAg; Ti3AlNb; atom site occupation; computer modelling; doping elements; dual-phase alloys; field evaporation; field ion microscopy; gamma-phase; lamellar structure; microstructural parameters; next neighbour interaction; tomographic atom probe; Aluminum alloys; Computational modeling; Computer simulation; Doping; Intermetallic; Probes; Semiconductor process modeling; Titanium alloys; Tomography; Transmission electron microscopy;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International
Conference_Location :
Guilin
Print_ISBN :
1-4244-0401-0
DOI :
10.1109/IVNC.2006.335335
