• DocumentCode
    2048894
  • Title

    A design platform for 90-nm leakage reduction techniques

  • Author

    Royannez, Philippe ; Mair, Hugh ; Dahan, Franck ; Wagner, Mike ; Streeter, Mark ; Bouetel, Laurent ; Blasquez, Joel ; Clasen, H. ; Semino, G. ; Dong, Julie ; Scott, D. ; Pitts, B. ; Raibaut, Claudine ; Ko, Uming

  • Author_Institution
    Texas Instruments, Villeneuve, France
  • fYear
    2005
  • fDate
    13-17 June 2005
  • Firstpage
    549
  • Lastpage
    550
  • Abstract
    Methodology, EDA flow, scripts, and documentation play a tremendous role in the deployment and standardization of advanced design techniques. In this paper we focus not only on leakage reduction techniques but also on their deployment as a worldwide infrastructure as the added-value resides not only in the techniques themselves but also in the way they are implemented to build an efficient, re-usable, robust, low cost and portable platform. Techniques have been silicon proven on the 90-nm TI CMOS technology and is commonly used to design SoC with complexities over 100 million transistors.
  • Keywords
    CMOS digital integrated circuits; digital integrated circuits; integrated circuit design; leakage currents; system-on-chip; 90 nm; CMOS technology; SoC design; leakage power management; leakage reduction; wireless application processor; Application software; CMOS technology; Diodes; Electronic design automation and methodology; Energy management; Graphics; Libraries; Logic; Power control; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference, 2005. Proceedings. 42nd
  • Print_ISBN
    1-59593-058-2
  • Type

    conf

  • DOI
    10.1109/DAC.2005.193870
  • Filename
    1510390