Redox characteristics of amino acids using low pressure water vapor RF plasma

Author

Akiyoshi, Yusuke ; Nakahigashi, Akari ; Hayashi, Nobuya ; Kitazaki, Satoshi ; Iwao, Takuro ; Koga, Kazunori ; Shiratani, Masaharu

Author_Institution

Dept. of Electr. & Electron. Eng., Saga Univ., Saga, Japan

fYear

2010

fDate

21-24 Nov. 2010

Firstpage

1957

Lastpage

1959

Abstract

The redox reaction between cystein and cystine is studied using water vapor plasma produced by the RF discharge concerning the growth control of plants. The stress reaction of plants has been achieved, when the water vapor plasma is irradiated to the seeds or stem, leaf of plants such as radish sprout. The mechanism of the growth control is investigated by analyzing amino acids of cystein and cystine. The water vapor plasma can oxidize and reduce the cystein and cystine, respectively by choosing the plasma parameters. The redox reaction of cystein and cystine in thioredoxin would be the mechanism of the plant control.

Keywords

biochemistry; botany; molecular biophysics; organic compounds; oxidation; reduction (chemical); RF discharge; amino acids; cystein; cystine; leaf plants; plant control; plasma parameters; pressure water vapor RF plasma; radish sprout; redox reaction; stress reaction; thioredoxin; active species; cystein; plant growth control; redox reaction; thiol base; water vapor plasma;

fLanguage

English

Publisher

ieee

Conference_Titel

TENCON 2010 - 2010 IEEE Region 10 Conference

Conference_Location

Fukuoka

ISSN

pending

Print_ISBN

978-1-4244-6889-8

Type

conf

DOI

10.1109/TENCON.2010.5686467

Filename

5686467