DocumentCode :
2049382
Title :
OPERA: optimization with ellipsoidal uncertainty for robust analog IC design
Author :
Yang Xu ; Xin Li ; Kan-Lin Hsiung ; Boyd, Stephen ; Nausieda, I.
Author_Institution :
Dept. of Elec. & Comp. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear :
2005
fDate :
13-17 June 2005
Firstpage :
632
Lastpage :
637
Abstract :
As the design-manufacturing interface becomes increasingly complicated with IC technology scaling, the corresponding process variability poses great challenges for nanoscale analog/RF design. Design optimization based on the enumeration of process corners has been widely used, but can suffer from inefficiency and overdesign. In this paper we propose to formulate the analog and RF design with variability problem as a special type of robust optimization problem, namely robust geometric programming. The statistical variations in both the process parameters and design variables are captured by a pre-specified confidence ellipsoid. Using such optimization with ellipsoidal uncertainty approach, robust design can be obtained with guaranteed yield bound and lower design cost, and most importantly, the problem size grows linearly with number of uncertain parameters. Numerical examples demonstrate the efficiency and reveal the trade-off between the design cost versus the yield requirement. We will also demonstrate significant improvement in the design cost using this approach compared with corner-enumeration optimization.
Keywords :
analogue integrated circuits; circuit optimisation; design aids; geometric programming; integrated circuit design; radiofrequency integrated circuits; statistical analysis; IC technology scaling; OPERA; corner-enumeration optimization; design optimization; design-manufacturing interface; ellipsoidal uncertainty; nanoscale RF design; nanoscale analog design; robust analog IC design; robust geometric programming; robust optimization problem; statistical optimization; uncertain parameters; Algorithm design and analysis; Analog integrated circuits; Costs; Design optimization; Manufacturing processes; Permission; Radio frequency; Robustness; Semiconductor device manufacture; Uncertainty;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2005. Proceedings. 42nd
Print_ISBN :
1-59593-058-2
Type :
conf
DOI :
10.1109/DAC.2005.193888
Filename :
1510408
Link To Document :
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