DocumentCode :
2049423
Title :
Growth stimulation of radish sprouts using discharge plasmas
Author :
Kitazaki, Satoshi ; Yamashita, Daisuke ; Matsuzaki, Hidefumi ; Uchida, Giichirou ; Koga, Kazunori ; Shiratani, Masaharu ; Hayashi, Nobuya
Author_Institution :
Grad. Sch. of Inf. Sci. & Electr., Kyushu Univ., Fukuoka, Japan
fYear :
2010
fDate :
21-24 Nov. 2010
Firstpage :
1960
Lastpage :
1963
Abstract :
We have investigated growth stimulation of radish sprouts using nonthermal atmospheric pressure He discharge plasmas and low pressure O2 RF discharge plasmas. Seeds of radish sprouts were irradiated by one of these plasmas. After 7 days cultivation, the average length of sprouts with irradiation was 15-60% longer than those without irradiation. Reactive oxygen species may be involved in the growth stimulation mechanism.
Keywords :
biological effects of radiation; biological techniques; botany; crops; discharges (electric); plasma applications; growth stimulation mechanism; low pressure O<;sub>;2<;/sub>; RF discharge plasmas; nonthermal atmospheric pressure He discharge plasmas; radish sprout growth stimulation; radish sprout seeds; reactive oxygen species; time 7 day; nonthrmal atomospheric pressure discharge; plasma biotechnology; reactive oxygen spieces;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
TENCON 2010 - 2010 IEEE Region 10 Conference
Conference_Location :
Fukuoka
ISSN :
pending
Print_ISBN :
978-1-4244-6889-8
Type :
conf
DOI :
10.1109/TENCON.2010.5686474
Filename :
5686474
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2049423
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