DocumentCode
2049571
Title
Degradation effects in a-Si:H thin film transistors and their impact on circuit performance
Author
Allee, David R. ; Clark, Lawrence T. ; Shringarpure, Rahul ; Venugopal, Sameer M. ; Li, Zi P. ; Bawolek, Edward J.
Author_Institution
Flexible Display Center, Arizona State Univ., Tempe, AZ
fYear
2008
fDate
April 27 2008-May 1 2008
Firstpage
158
Lastpage
167
Abstract
Amorphous silicon thin film transistors degrade with electrical stress. In particular, the threshold voltage increases significantly with positive gate voltages. The characteristics and mechanisms of the degradation are reviewed. The implications for various types of circuitry including active matrix backplanes, integrated drivers and general purpose digital circuitry are examined. A circuit modeling tool that enables the prediction of complex circuit degradation is presented. Finally, the similarity of degradation in amorphous silicon to negative bias temperature instability in crystalline PMOS is discussed along with potential approaches to reducing the degradation effects.
Keywords
MOS digital integrated circuits; MOSFET; elemental semiconductors; hydrogen; silicon; thin film transistors; Si:H; active matrix backplanes; amorphous silicon thin film transistors; circuit modeling tool; complex circuit degradation; crystalline PMOS; electrical stress; gate voltages; general purpose digital circuitry; integrated drivers; negative bias temperature instability; threshold voltage; Amorphous silicon; Backplanes; Circuit optimization; Degradation; Driver circuits; Negative bias temperature instability; Predictive models; Stress; Thin film transistors; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
Conference_Location
Phoenix, AZ
Print_ISBN
978-1-4244-2049-0
Electronic_ISBN
978-1-4244-2050-6
Type
conf
DOI
10.1109/RELPHY.2008.4558878
Filename
4558878
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