• DocumentCode
    2049571
  • Title

    Degradation effects in a-Si:H thin film transistors and their impact on circuit performance

  • Author

    Allee, David R. ; Clark, Lawrence T. ; Shringarpure, Rahul ; Venugopal, Sameer M. ; Li, Zi P. ; Bawolek, Edward J.

  • Author_Institution
    Flexible Display Center, Arizona State Univ., Tempe, AZ
  • fYear
    2008
  • fDate
    April 27 2008-May 1 2008
  • Firstpage
    158
  • Lastpage
    167
  • Abstract
    Amorphous silicon thin film transistors degrade with electrical stress. In particular, the threshold voltage increases significantly with positive gate voltages. The characteristics and mechanisms of the degradation are reviewed. The implications for various types of circuitry including active matrix backplanes, integrated drivers and general purpose digital circuitry are examined. A circuit modeling tool that enables the prediction of complex circuit degradation is presented. Finally, the similarity of degradation in amorphous silicon to negative bias temperature instability in crystalline PMOS is discussed along with potential approaches to reducing the degradation effects.
  • Keywords
    MOS digital integrated circuits; MOSFET; elemental semiconductors; hydrogen; silicon; thin film transistors; Si:H; active matrix backplanes; amorphous silicon thin film transistors; circuit modeling tool; complex circuit degradation; crystalline PMOS; electrical stress; gate voltages; general purpose digital circuitry; integrated drivers; negative bias temperature instability; threshold voltage; Amorphous silicon; Backplanes; Circuit optimization; Degradation; Driver circuits; Negative bias temperature instability; Predictive models; Stress; Thin film transistors; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
  • Conference_Location
    Phoenix, AZ
  • Print_ISBN
    978-1-4244-2049-0
  • Electronic_ISBN
    978-1-4244-2050-6
  • Type

    conf

  • DOI
    10.1109/RELPHY.2008.4558878
  • Filename
    4558878