Title :
BEOL variability and impact on RC extraction
Author :
Nagaraj, N.S. ; Bonifield, Tom ; Singh, Abha ; Bittlestone, Clive ; Narasimha, Usha ; Le, Viet ; Hill, Anthony
Author_Institution :
Texas Instruments Inc., Dallas, TX, USA
Abstract :
Historically, back end of line (BEOL) or interconnect resistance and capacitance have been viewed as parasitic components. They have now become key parameters with significant impact on circuit performance and signal integrity. This paper examines the types of BEOL variations and their impact on RC extraction. The importance of modeling systematic effects in RC extraction is discussed. The need for minimizing the computational error in RC extraction before incorporating random process variations is emphasized.
Keywords :
RC circuits; integrated circuit interconnections; integrated circuit modelling; BEOL variability; BEOL variations; RC extraction; back end of line; circuit performance; interconnect capacitance; interconnect resistance; parasitic components; process variations; signal integrity; Chemical technology; Circuit optimization; Copper; Crosstalk; Delay; Etching; Hardware; Instruments; Integrated circuit interconnections; Parasitic capacitance;
Conference_Titel :
Design Automation Conference, 2005. Proceedings. 42nd
Print_ISBN :
1-59593-058-2
DOI :
10.1109/DAC.2005.193913
