An effective DFM strategy requires accurate process and IP pre-characterization

The design methodology called design for manufacturing (DFM) includes a set of techniques to modify the design of ICs in order to make them more manufacturable, i.e. to improve their functional yield, parametric yield, or reliability. Traditionally DFM in the prenanometer era consisted of different methodologies aimed at relaxing the mask layout shapes of an IC at the full chip level in order to minimize its failure probability, for example, increasing the feature spacing and width, and adding redundant contacts and vias where possible.