Nano metamaterials and photonic gratings by nanoimprint and hot embossing

This paper reviews our recent progress in nanoimprint lithography and hot embossing for the fabrications of planar photonic meta-materials and photonic gratings. With these technologies, dielectric, metallic chiral structures and dense gratings in sizes from sub micrometres down to sub-100 nm were successfully fabricated. Characterisations of these meta-materials and photonic structures indicate these materials and structures are functional. It can be concluded that nanoimporint lithography and hot embossing are capable of achieving large area planar optic meta-materials and photonic structures such as dense gratings. This progress suggests the great prospect of these techniques for fast speed patterning of important meta materials and photonic nanostructures with high throughput at low cost in mass production in the future.