• DocumentCode
    2050271
  • Title

    A capacitance reliability degradation mechanism in Hyper-abrupt junction varactors

  • Author

    Abadeer, W. ; Rassel, R. ; Johnson, J.B.

  • Author_Institution
    IBM Syst. & Technol. Group, Essex Junction, VT
  • fYear
    2008
  • fDate
    April 27 2008-May 1 2008
  • Firstpage
    310
  • Lastpage
    314
  • Abstract
    Junction varactors form key passive components for RF and analog application where capacitance could be tuned by a control voltage. This paper details and models a reliability degradation mechanism due to electron trapping at the side of shallow trench isolation (STI) of the varactor, leading to systematic capacitance degradation as function of time and stress conditions. A key dimension which controls this mechanism is the anode width or spacing between STI, where a minimum value should be defined to meet reliability targets.
  • Keywords
    capacitance; electron traps; isolation technology; semiconductor device reliability; varactors; anode spacing; anode width; capacitance; electron trapping; hyper-abrupt junction varactors; reliability degradation mechanism; shallow trench isolation; Anodes; Capacitance; Capacitors; Charge carriers; Degradation; Doping profiles; P-n junctions; Stress; Varactors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
  • Conference_Location
    Phoenix, AZ
  • Print_ISBN
    978-1-4244-2049-0
  • Electronic_ISBN
    978-1-4244-2050-6
  • Type

    conf

  • DOI
    10.1109/RELPHY.2008.4558903
  • Filename
    4558903