Title :
Impact of IC wafer fab and assembly fab processes on package stress induced product reliability issues - an insight into the package stress relief design rules by simulation
Author :
Li, Y. ; van Gils, M.A.J. ; van Driel, W.D. ; van Silfhout, R.B.R. ; Bisschop, J. ; Janssen, J.H.J. ; Zhang, G.Q.
Author_Institution :
NXP Semicond., Nijmegen
fDate :
April 27 2008-May 1 2008
Abstract :
In this work the impact of the layout of the top metal of the integrated circuit (IC) and the most relevant process and material parameters of IC wafer fab and assembly fab on package stress induced damages to the ICs during temperature cycling is studied by means of thermo-mechanical simulations with experimental verifications. Besides die size, the materials for passivation, silicon thickness, molding compound properties, the cohesion between the molding compound and the die surface, and lead frame yield stress, all are found to significantly influence the risk of damages or failures on the IC surface. The results suggest a more complete package stress relief design rule, pointing to a systematic approach to eliminate or suppress the package stress induced damages to the IC and consequently a possibly more efficient use of the silicon area in IC design.
Keywords :
integrated circuit packaging; integrated circuit reliability; passivation; yield stress; IC design; IC wafer fabrication; assembly fabrication processes; cohesion; lead frame yield stress; molding compound properties; package stress induced product reliability; package stress relief design; passivation; silicon thickness; thermomechanical simulations; Assembly; Circuit simulation; Inorganic materials; Integrated circuit layout; Integrated circuit packaging; Integrated circuit reliability; Silicon; Temperature; Thermal stresses; Thermomechanical processes; Package; package stress relief design rules; product reliability; thermo-mechanical stress;
Conference_Titel :
Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
Conference_Location :
Phoenix, AZ
Print_ISBN :
978-1-4244-2049-0
Electronic_ISBN :
978-1-4244-2050-6
DOI :
10.1109/RELPHY.2008.4558928