DocumentCode
2051016
Title
Focused ion-beam fabrication of nanoscale magnetic structures
Author
Litvinov, D. ; Chen, F. ; Svedberg, E. ; Ambrose, T. ; Bain, J.A. ; Schlesinger, T.E. ; Howard, J.K. ; Khizroev, S.
Author_Institution
Seagate Res., Pittsburgh, PA, USA
fYear
2003
fDate
March 30 2003-April 3 2003
Abstract
In this article, the direct FIB etching of magnetic thin films to form nanostructures is explored. The effect of Ga+ ion implantation on magnetic properties as well as possibility of using thin capping layers to reduce Ga+ implantation are studied. The shape and size dependence of magnetic domain patterns in FIB- fabricated nanostructures are investigated.
Keywords
cobalt; ferromagnetic materials; focused ion beam technology; ion beam effects; ion implantation; magnetic domains; magnetic structure; magnetic thin films; nanostructured materials; Co; FIB etching; Ga+ ion implantation; focused ion beam fabrication; magnetic domain patterns; magnetic properties; magnetic thin films; nanoscale magnetic structures; thin capping layers; Electron beams; Etching; Fabrication; Ion beams; Magnetic domains; Magnetic films; Magnetic materials; Magnetosphere; Nanostructures; Perpendicular magnetic recording;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7647-1
Type
conf
DOI
10.1109/INTMAG.2003.1230648
Filename
1230648
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