DocumentCode :
2052152
Title :
A cross-layer fault-tolerant design method for high manufacturing yield and system reliability
Author :
Jianghao Guo ; Qiang Han ; Wen-Ben Jone ; Yu-Liang Wu
Author_Institution :
Sch. of Electron. & Comput. Syst., Univ. of Cincinnati, Cincinnati, OH, USA
fYear :
2013
fDate :
2-4 Oct. 2013
Firstpage :
71
Lastpage :
76
Abstract :
This paper describes a cross-layer design method for digital circuit fault-tolerant design. This cross-layer hierarchical scheme mainly contains selective duplication in logic level and spare cache design in micro-architecture level, working together seamlessly. When compared to traditional fault tolerance techniques, this method takes advantage of information from different circuit design levels to generate an effective solution. It also has great potential to work with other circuit design levels (e.g., core level) to meet the high demand in system reliability and robustness. Experimental results obtained using an ARM core instruction decoder demonstrate that, on average, the number of fault-free circuits is increased 250% by selectively duplicating 25% of the decoder. On top of selective duplication in logic level, adding a spare cache with 5 to 20 cache lines in micro-architecture level can further increase the number of fault-free circuits by 0.66 to 49.83 times depending on different number of defects injected.
Keywords :
cache storage; digital circuits; fault tolerance; integrated circuit reliability; integrated circuit yield; logic design; ARM core instruction decoder; circuit design levels; cross-layer fault-tolerant design method; cross-layer hierarchical scheme; digital circuit fault-tolerant design; fault-free circuits; high manufacturing yield; logic level; microarchitecture level; selective duplication; spare cache design; system reliability; Circuit faults; Computer architecture; Educational institutions; Fault tolerant systems; Redundancy; Robustness; Cross-Layer Reliability; Fault Tolerance; Micro-Architecture;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Defect and Fault Tolerance in VLSI and Nanotechnology Systems (DFT), 2013 IEEE International Symposium on
Conference_Location :
New York City, NY
ISSN :
1550-5774
Print_ISBN :
978-1-4799-1583-5
Type :
conf
DOI :
10.1109/DFT.2013.6653585
Filename :
6653585
Link To Document :
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