Title :
Modifying the nanostructure of Co[SiO2] samples by controlled annealing
Author :
Denardin, J.C. ; Knobel, M. ; Socolovsky, L.M. ; Brandl, A.L. ; Zhang, X.X.
Author_Institution :
Inst. de Fisica Gleb Wataghin, Univ. Estadual de Campinas, Sao Paulo, Brazil
fDate :
March 30 2003-April 3 2003
Abstract :
In this article, on-line measurements of resistance were made on co-sputtered Co[SiO/sub 2/] /sub 0.65/ granular films during annealing. The aim was to control the thermal treatment parameters and map the microstructural changes in the sample, and the respective magnetotransport response.
Keywords :
annealing; cobalt; crystal microstructure; ferromagnetic materials; magnetic thin films; magnetoresistance; nanocomposites; silicon compounds; sputtered coatings; Co-SiO/sub 2/; Co[SiO/sub 2/] nanostructure; annealing; co-sputtered Co[SiO/sub 2/] /sub 0.65/ granular films; magnetotransport response; microstructure; thermal treatment; Annealing; Conductivity; Cooling; Curve fitting; Tin;
Conference_Titel :
Magnetics Conference, 2003. INTERMAG 2003. IEEE International
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7647-1
DOI :
10.1109/INTMAG.2003.1230705
