• DocumentCode
    2052666
  • Title

    Supply signal fluctuations due to chip power grid resonance — a new reliability concern

  • Author

    Gurfinkel, M. ; Livshits, P. ; Rozen, A. ; Fefer, Y. ; Bernstein, J.B. ; Shapira, Yoram

  • Author_Institution
    Sch. of EE, Tel Aviv Univ., Tel Aviv
  • fYear
    2008
  • fDate
    April 27 2008-May 1 2008
  • Firstpage
    721
  • Lastpage
    722
  • Abstract
    On-die measurements of VDD and VSS signals inside a 90 nm technology chip are presented. The results show fluctuations in the VDD and VSS signals, which might constitute an important new reliability concern. These fluctuations also indirectly affect other reliability mechanisms, such as NBTI, HCI and TDDB. Simulations predict aggravation of this phenomenon for future technologies, which may prove to be a show stopper for further scaling.
  • Keywords
    fluctuations; integrated circuit reliability; nanotechnology; power grids; HCI; NBTI; TDDB; chip power grid resonance; integrated circuit reliability; nanotechnology chip; size 90 nm; supply signal fluctuations; CMOS technology; Fluctuations; Human computer interaction; Logic testing; Niobium compounds; Power grids; Resonance; Semiconductor device measurement; Titanium compounds; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 2008. IRPS 2008. IEEE International
  • Conference_Location
    Phoenix, AZ
  • Print_ISBN
    978-1-4244-2049-0
  • Electronic_ISBN
    978-1-4244-2050-6
  • Type

    conf

  • DOI
    10.1109/RELPHY.2008.4559006
  • Filename
    4559006