DocumentCode :
2054114
Title :
Preperation of Alq3 Thin Films for Organic ElectroLuminescence using plasma ablation method
Author :
Kawasaki, Hiroharu ; Suda, Yoshiaki ; Ohshima, Tamiko ; Yagyu, Yoshihito
Author_Institution :
Sasebo Nat. Coll. of Technol., Nagasaki, Japan
fYear :
2010
fDate :
21-24 Nov. 2010
Firstpage :
2233
Lastpage :
2236
Abstract :
Organic electroluminescence thin films were prepared by pulsed laser deposition method using high density Alq3 (tris (8-hydroxyquinoline) aluminum) targets which produced by shock compaction technology. The experimental results suggest that Alq3 thin films can be deposited at high fluence above 2.3J/cm2. XPS results suggest that prepared Alq3 films have Al 2p peak, and the spectrum have peak shift caused by oxidation. UV-Vis spectrum shows that the prepared films have absorption around 400 nm. The results suggest that PLD method maybe one of the effective method to prepare high quality Alq3 films which work as organic electro-luminescence displays.
Keywords :
X-ray photoelectron spectra; aluminium compounds; electroluminescence; organic compounds; oxidation; plasma materials processing; pulsed laser deposition; thin films; ultraviolet spectra; visible spectra; (tris (8-hydroxyquinoline) aluminum); UV-vis spectra; XPS; absorption spectra; organic electroluminescence thin film preparation; oxidation; plasma ablation method; pulsed laser deposition; shock compaction technology; Organic electroluminescence film; Plasma processing; Pulsed laser deposition; plasma process;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
TENCON 2010 - 2010 IEEE Region 10 Conference
Conference_Location :
Fukuoka
ISSN :
pending
Print_ISBN :
978-1-4244-6889-8
Type :
conf
DOI :
10.1109/TENCON.2010.5686661
Filename :
5686661
Link To Document :
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