• DocumentCode
    2055954
  • Title

    Power quality improvement with SVC in power supply system

  • Author

    Zhongyuan Zhao ; Peng Fei ; Shunxian Bao ; Yong Ding

  • Author_Institution
    NanJing NARI-RELAYS Electr. Co. Ltd., Nanjing, China
  • fYear
    2012
  • fDate
    10-14 Sept. 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    PCS9580 static reactive power compensation system presents an independent development of fast open-loop control algorithm and closed-loop stable control strategies to provide effective voltage support and reactive power compensation for the power network and load. It can effectively suppress voltage fluctuations, with voltage flicker improvement rate more than 50%. And filters parameters are optimized with good harmonic suppression function, in order to effectively improve the quality of power supply. A complete secondary control and protection strategies is presented here and network configuration solution can effectively achieve the dynamic damping of the power network, transient voltage regulation, and instantaneous strong compensation function.
  • Keywords
    closed loop systems; compensation; damping; harmonics suppression; open loop systems; optimisation; power filters; power supply quality; power system protection; reactive power control; static VAr compensators; thyristor applications; transient analysis; voltage control; PCS9580; SVC; closed loop stable control strategy; dynamic damping; filter parameter optimization; harmonic suppression function; load; open loop control algorithm; power network; power supply quality improvement; power supply system; protection strategy; secondary control strategy; static reactive power compensation system; transient voltage regulation; voltage flicker improvement; voltage fluctuation suppression; SVC; grid stability; power quality; voltage flicker; voltage fluctuations;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electricity Distribution (CICED), 2012 China International Conference on
  • Conference_Location
    Shanghai
  • ISSN
    2161-7481
  • Print_ISBN
    978-1-4673-6065-4
  • Electronic_ISBN
    2161-7481
  • Type

    conf

  • DOI
    10.1109/CICED.2012.6508402
  • Filename
    6508402