A Novel Model for Surface Evolvement and Footing Effect Simulations in DRIE Fabrications

Author

Jian Zhang ; Qing-An Huang

Author_Institution

Key Lab. of MEMS of Minist. of Educ., Southeast Univ., Nanjing

fYear

2006

fDate

18-21 Jan. 2006

Firstpage

770

Lastpage

774

Abstract

A novel model for surface evolvement and footing effect simulations in ICP DRIE fabrications is reported, which is based on time multiplexed deep etching (TMDE). It couples the advanced plasma sheath approximation and has the simplex data structure due to 2-D string algorithm. Furthermore, the model has the ability to simulate the footing effect if some reasonable descriptions for footing surface are assumed. The simulation results are in agreement with the experiments.

Keywords

micromechanical devices; plasma sheaths; sputter etching; 2D string algorithm; ICP DRIE fabrication; MEMS fabrication; NEMS fabrication; advanced plasma sheath approximation; deep reactive ion etching; footing effect simulation; inductively coupled plasma etching; surface evolvement; time multiplexed deep etching; Approximation algorithms; Etching; Fabrication; Micromechanical devices; Nanoelectromechanical systems; Plasma applications; Plasma sheaths; Plasma temperature; Plasma transport processes; Silicon on insulator technology; DRIE; footing effect; model; surface evolvement;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on

Conference_Location

Zhuhai

Print_ISBN

1-4244-0139-9

Electronic_ISBN

1-4244-0140-2

Type

conf

DOI

10.1109/NEMS.2006.334892

Filename

4135065