• DocumentCode
    2057184
  • Title

    Field Emission Characteristics of Carbon Nanotube Films Fabricated by Different Methods

  • Author

    Guo, Linrui ; Ye, Xiongying ; Li, Hua ; Liu, Yitao ; Zhou, Zhaoying

  • Author_Institution
    Dept. of Precision Instrum. & Mechanology, Tsinghua Univ., Beijing
  • fYear
    2006
  • fDate
    18-21 Jan. 2006
  • Firstpage
    951
  • Lastpage
    954
  • Abstract
    In order to improve the performance of field emitters nowadays, carbon nanotubes are used instead of conventional materials such as silicon and metals. In this paper, field emission characteristics of three different multi-wall carbon nanotube films have been compared, which are fabricated by different methods, including direct growth, evaporation coating and flow assembly. The field emission current-voltage property of each film has been characterized experimentally, and the electric field enhancement factor has been analyzed using Fowler-Nordheim theory. Moreover, emission stability of each film has been measured too. It can be concluded that the direct-grown vertical multi-wall carbon nanotube array has turn-on field of 0.603 V/mum and current density fluctuation less than 5%, which is much lower than the other films by post-treatment processes.
  • Keywords
    carbon nanotubes; chemical vapour deposition; field emission; self-assembly; thin films; vacuum deposition; C; Fowler-Nordheim theory; chemical vapor deposition; current density fluctuation; current-voltage property; direct growth method; electric field enhancement factor; evaporation coating; field emission; flow assembly; multiwall carbon nanotube films; post-treatment processes; turn-on field; Assembly; Carbon nanotubes; Chemical vapor deposition; Coatings; Current density; Instruments; Magnetic field measurement; Silicon; Stability; Substrates; carbon nanotube; direct growth; field emission; post-treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on
  • Conference_Location
    Zhuhai
  • Print_ISBN
    1-4244-0139-9
  • Electronic_ISBN
    1-4244-0140-2
  • Type

    conf

  • DOI
    10.1109/NEMS.2006.334572
  • Filename
    4135105