An Improved 3D Simulator for MEMS Processes

A new improved comprehensive 3D surface simulator is presented for different MEMS processes. The simulator consists of three parts: the common surface evolution models, 3D represent layer, and physical processes model interface. The surface evolution models including faster surface string model and material cell-removal model, function as a common 3D surface and structure generator, segment control and loops are detectible and solved by the improved evolution algorithm. A WTK virtual environment is used as the 3D display interface for representing the 3D-results generated in surface evolution. Different physical models, experiment parameters, materials and so on, will be described in the data layer. Using this simulator, the isotropic etching, anisotropic etching, deposition and DRIE processes are simulated.