DocumentCode
2058136
Title
Analytical carrier transport model for arbitrarily shallow p-n junctions
Author
Popadic, Milos ; Lorito, Gianpaolo ; Nanver, Lis K.
Author_Institution
Lab. of Electron. Components, Delft Univ. of Technol., Delft
fYear
2008
fDate
11-14 May 2008
Firstpage
155
Lastpage
158
Abstract
This paper presents for the first time an analytical model of arbitrarily shallow p-n junctions. Depending on the junction depth, electrical characteristics of ultra-shallow p-n junctions can vary from the characteristics of standard Schottky diodes to standard deep p-n junctions. Therefore, this model successfully unifies the standard Schottky and p-n diode expressions. In the crossover region, where the shallow doping can be totally depleted, electrical characteristics phenomenologically substantially different from typical diode characteristics are predicted. These predictions and the accuracy of the presented model are evaluated by comparison with the MEDICI simulations. Furthermore, ultra-shallow n+-p diodes were fabricated, and the anomalous behavior in the crossover regime was experimentally observed.
Keywords
Schottky diodes; p-n junctions; I-V characteristics; MEDICI simulations; Schottky diode; analytical carrier transport model; crossover regime; shallow p-n junctions; Analytical models; Doping; Electric variables; Equations; Medical simulation; P-n junctions; Predictive models; Schottky barriers; Schottky diodes; Semiconductor process modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics, 2008. MIEL 2008. 26th International Conference on
Conference_Location
Nis
Print_ISBN
978-1-4244-1881-7
Electronic_ISBN
978-1-4244-1882-4
Type
conf
DOI
10.1109/ICMEL.2008.4559246
Filename
4559246
Link To Document