• DocumentCode
    2058722
  • Title

    Fabrication of Nano-scale Reference Materials with Scanning Probe Microscopy (SPM)-based Lithography

  • Author

    Jing, Wei-Xuan ; Jiang, Zhuang-De ; Zhu, Ming-Zhi ; Zhao, Feng-Xia ; Han, Guo-Qiang

  • fYear
    2006
  • fDate
    18-21 Jan. 2006
  • Firstpage
    1194
  • Lastpage
    1197
  • Abstract
    Three SPM-based techniques are put forward to fabricate 1D and 2D nanoscale reference materials, i.e. atomic force microscopy (AFM) tip-induced anodic oxidation on Si substrate, scanning tunneling microscopy (STM) current-induced oxidation on Ti film as well as AFM tip-scratching on Au film. The experimental parameters are analyzed and classified. For AFM tip-induced anodic oxidation on Si substrate and STM current-induced oxidation on Ti film, influencing factors include applied tip bias, tip curvature radii, scanning rate, scanning size, surface quality of sample and relative humidity and etc. For AFM tip-scratching, influencing factors include applied tip bias, tip curvature radii, scratching rate, scratching length, scratching cycles, surface quality of sample, and etc. Based on the optimization of the respectively experimental parameters, 1D and 2D nanoscale reference materials are fabricated. The fabrication accuracy of nanoscale reference materials is analyzed, and the relations between the accuracy of the grating line and the respectively experimental parameters are also obtained
  • Keywords
    anodisation; atomic force microscopy; films; nanolithography; oxidation; scanning tunnelling microscopy; substrates; 1D nanoscale reference materials; 2D nanoscale reference materials; AFM tip-scratching; Au; SPM-based lithography; STM; Si; Ti; applied tip bias; atomic force microscopy; current-induced oxidation; gold film; grating line accuracy; nanoscale reference material fabrication; relative humidity; sample surface quality; scanning probe microscopy; scanning rate; scanning size; scanning tunneling microscopy; scratching cycles; scratching length; scratching rate; silicon substrate; tip curvature radii; tip-induced anodic oxidation; titanium film; Atomic force microscopy; Fabrication; Gold; Lithography; Nanostructured materials; Oxidation; Scanning probe microscopy; Semiconductor films; Substrates; Tunneling; Calibrate; Metrology; Reference material; Scanning probe microscopy; Traceability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems, 2006. NEMS '06. 1st IEEE International Conference on
  • Conference_Location
    Zhuhai
  • Print_ISBN
    1-4244-0139-9
  • Electronic_ISBN
    1-4244-0140-2
  • Type

    conf

  • DOI
    10.1109/NEMS.2006.334678
  • Filename
    4135160