• DocumentCode
    2058911
  • Title

    RF/microwave device fabrication in silicon-on-glass technology

  • Author

    Nanver, L.K. ; Schellevis, H. ; Scholtes, T.L.M. ; Spina, L. La ; Lorito, G. ; Sarubbi, F. ; Gonda, V. ; Popadic, M. ; Buisman, K. ; de Vreede, L.C.N. ; Huang, C. ; Milosavljevic, S. ; Goudena, E.J.G.

  • Author_Institution
    Dept. of Microelectron., Delft Univ. of Technol., Delft
  • fYear
    2008
  • fDate
    11-14 May 2008
  • Firstpage
    273
  • Lastpage
    280
  • Abstract
    This paper reviews recent developments in circuit and device implementations based on back-wafer contacted silicon-on-glass (SOG) substrate-transfer technology (STT). This technology has been specifically developed for the enhancement of silicon RF and microwave device and circuit performance. While metal transmission lines can be placed on the low-loss glass substrate, the resistive and capacitive parasitics of the silicon devices can also be minimized by a direct contacting of the parts of the devices that are usually connected via the bulk Si. Focus is placed here on the device level aspects of the SOG process, in particular high-quality varactors for high-linearity adaptive circuits and complementary bipolar device integration are treated in relationship to new developments in back-wafer contacting and the integration of AlN heatspreaders.
  • Keywords
    microwave devices; silicon-on-insulator; substrates; varactors; AlN heatspreaders; RF/microwave device fabrication; Si; back-wafer contacting; silicon-on-glass; substrate-transfer technology; varactors; Circuit optimization; Distributed parameter circuits; Electromagnetic heating; Fabrication; Glass; Microwave devices; Microwave technology; Radio frequency; Silicon devices; Varactors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics, 2008. MIEL 2008. 26th International Conference on
  • Conference_Location
    Nis
  • Print_ISBN
    978-1-4244-1881-7
  • Electronic_ISBN
    978-1-4244-1882-4
  • Type

    conf

  • DOI
    10.1109/ICMEL.2008.4559277
  • Filename
    4559277