DocumentCode
2058911
Title
RF/microwave device fabrication in silicon-on-glass technology
Author
Nanver, L.K. ; Schellevis, H. ; Scholtes, T.L.M. ; Spina, L. La ; Lorito, G. ; Sarubbi, F. ; Gonda, V. ; Popadic, M. ; Buisman, K. ; de Vreede, L.C.N. ; Huang, C. ; Milosavljevic, S. ; Goudena, E.J.G.
Author_Institution
Dept. of Microelectron., Delft Univ. of Technol., Delft
fYear
2008
fDate
11-14 May 2008
Firstpage
273
Lastpage
280
Abstract
This paper reviews recent developments in circuit and device implementations based on back-wafer contacted silicon-on-glass (SOG) substrate-transfer technology (STT). This technology has been specifically developed for the enhancement of silicon RF and microwave device and circuit performance. While metal transmission lines can be placed on the low-loss glass substrate, the resistive and capacitive parasitics of the silicon devices can also be minimized by a direct contacting of the parts of the devices that are usually connected via the bulk Si. Focus is placed here on the device level aspects of the SOG process, in particular high-quality varactors for high-linearity adaptive circuits and complementary bipolar device integration are treated in relationship to new developments in back-wafer contacting and the integration of AlN heatspreaders.
Keywords
microwave devices; silicon-on-insulator; substrates; varactors; AlN heatspreaders; RF/microwave device fabrication; Si; back-wafer contacting; silicon-on-glass; substrate-transfer technology; varactors; Circuit optimization; Distributed parameter circuits; Electromagnetic heating; Fabrication; Glass; Microwave devices; Microwave technology; Radio frequency; Silicon devices; Varactors;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics, 2008. MIEL 2008. 26th International Conference on
Conference_Location
Nis
Print_ISBN
978-1-4244-1881-7
Electronic_ISBN
978-1-4244-1882-4
Type
conf
DOI
10.1109/ICMEL.2008.4559277
Filename
4559277
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