DocumentCode :
2060269
Title :
Nanorheology of squeezed polymer films
Author :
Connell, Barry O. ; Cross, Graham L W ; Pethica, John B. ; Oliver, Warren
Author_Institution :
SFI Nanosci. Lab., Trinity Coll., Dublin, Ireland
Volume :
2
fYear :
2003
fDate :
12-14 Aug. 2003
Firstpage :
793
Abstract :
We present investigations of submicrometer quasi-two dimensional flow mechanics of squeezed thin polymer films in the context of nanoimprint lithography. The polymer films were indented by patterned spherical indenters above and below the glass transition region in a temperature controlled nanoindenter. Static and dynamical mechanical characteristics of the contact were monitored during the printing process. We demonstrate the relation of substrate deformation in the cold embossing technique and residual stress relaxation during hot embossing to the overall pattern transfer fidelity during isothermal stamping.
Keywords :
elastic deformation; embossing; glass transition; indentation; internal stresses; nanolithography; polymer films; rheology; stress relaxation; cold embossing method; dynamical mechanical characteristics; glass transition; hot embossing; isothermal stamping; nanoimprint lithography; nanoindenter; nanorheology; pattern transfer fidelity; patterned spherical indenters; residual stress relaxation; squeezed thin polymer films; statical mechanical characteristics; submicrometer quasi two dimensional flow mechanics; substrate deformation; Embossing; Milling; Polymer films; Printing; Residual stresses; Shape; Silicon; Substrates; Temperature; Tungsten;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN :
0-7803-7976-4
Type :
conf
DOI :
10.1109/NANO.2003.1231033
Filename :
1231033
Link To Document :
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