The overview of scanning probe lithography by electron beam exposure of organic resists

Author

Zhang, L.B. ; Shi, J.X. ; Yuan, J.L. ; Chang, M. ; Wang, X.H.

Author_Institution

Coll. of Mech. & Electr. Eng., Zhejiang Univ. of Technol., Hangzhou, China

Volume

2

fYear

2003

fDate

12-14 Aug. 2003

Firstpage

797

Abstract

SPM-based lithography, referred to as Scanning Probe Lithography (SPL), is compatible with a wide range of surfaces, including organic resists. SPL by means of electron beam exposure of types of organic resists using STM or conducting AFM is described in this review. The emphasis is placed on the qualitative analyses of the factors in affecting exposure resolution, which include the properties of organic resists, exposure dose, underlying substrates and tip materials, and relative humidity. On the basis of the foresaid analyses, the tip-sample bias is considered to be a crucial factor in the successful application of this SPL and the tendency of the research concerned is proposed.

Keywords

atomic force microscopy; humidity; lithography; organic compounds; resists; scanning probe microscopy; scanning tunnelling microscopy; STM; conducting AFM; electron beam exposure; exposure dose; exposure resolution; organic resists; relative humidity; scanning probe lithography; tip materials; tip sample bias; underlying substrates; Chemical vapor deposition; Conducting materials; Electron beams; Inorganic materials; Lithography; Organic materials; Probes; Resists; Spatial resolution; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on

Print_ISBN

0-7803-7976-4

Type

conf

DOI

10.1109/NANO.2003.1231034

Filename

1231034