Nanostructured plasma polymer coatings on novel silica structures

Author

Manian, Hrishikesh ; van Ooij, W.J. ; Guliants, V.V.

Author_Institution

Dept. of Chem. & Mater. Eng., Cincinnati Univ., OH, USA

Volume

2

fYear

2003

fDate

12-14 Aug. 2003

Firstpage

828

Abstract

Extremely thin films of acetylene of the order of 30 nm have been deposited using RF Plasma polymerization method on nanostructured porous silica. The thickness of the films were determined and optimized by ellipsometry. The films were characterized by Atomic Force Microscopy. The surface energy modification was determined using the contact angle technique. The mechanical properties of the films were studied by nanoindentation and nanoscratch testing.

Keywords

atomic force microscopy; ellipsometry; indentation; materials testing; nanoporous materials; plasma deposition; polymer films; polymerisation; silicon compounds; surface energy; surface roughness; 30 nm; SiO₂; acetylene thin film; atomic force microscopy; contact angle technique; ellipsometry; mechanical properties; nanoindentation; nanoscratch testing; nanostructured materials; nanostructured porous silica; plasma polymer coatings; rf plasma polymerization; silica structures; surface energy; Atomic force microscopy; Atomic layer deposition; Ellipsometry; Mechanical factors; Plasma properties; Polymer films; Radio frequency; Silicon compounds; Sputtering; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on

Print_ISBN

0-7803-7976-4

Type

conf

DOI

10.1109/NANO.2003.1231042

Filename

1231042