Title :
Nanostructured plasma polymer coatings on novel silica structures
Author :
Manian, Hrishikesh ; van Ooij, W.J. ; Guliants, V.V.
Author_Institution :
Dept. of Chem. & Mater. Eng., Cincinnati Univ., OH, USA
Abstract :
Extremely thin films of acetylene of the order of 30 nm have been deposited using RF Plasma polymerization method on nanostructured porous silica. The thickness of the films were determined and optimized by ellipsometry. The films were characterized by Atomic Force Microscopy. The surface energy modification was determined using the contact angle technique. The mechanical properties of the films were studied by nanoindentation and nanoscratch testing.
Keywords :
atomic force microscopy; ellipsometry; indentation; materials testing; nanoporous materials; plasma deposition; polymer films; polymerisation; silicon compounds; surface energy; surface roughness; 30 nm; SiO2; acetylene thin film; atomic force microscopy; contact angle technique; ellipsometry; mechanical properties; nanoindentation; nanoscratch testing; nanostructured materials; nanostructured porous silica; plasma polymer coatings; rf plasma polymerization; silica structures; surface energy; Atomic force microscopy; Atomic layer deposition; Ellipsometry; Mechanical factors; Plasma properties; Polymer films; Radio frequency; Silicon compounds; Sputtering; Testing;
Conference_Titel :
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN :
0-7803-7976-4
DOI :
10.1109/NANO.2003.1231042
