Title :
Noise and resistance as indicators of HVP stressing impact on performances of conventional TFRs
Author :
Stanimirovic, I. ; Jevtic, M.M. ; Stanimirovic, Z.
Author_Institution :
IRITEL A.D., Belgrade
Abstract :
In order to determine possible causes of resistance and noise index changes in thick-film resistors during high- voltage pulse stressing, deterministic model was used. Irreversible micro- and macro-structural changes observed during high- voltage pulse stressing of thick film resistors based on 1, 10 and 100 kOmega/sq compositions were analyzed and performed analysis resulted in determination of primary technological, geometrical and physical parameters responsible for observed changes.
Keywords :
noise; thick film resistors; HVP stressing impact; conventional TFR; deterministic model; high-voltage pulse stressing; noise index change; thick-film resistors; Acoustical engineering; Electrical resistance measurement; Frequency; Microelectronics; Niobium; Noise measurement; Performance analysis; Resistors; Static VAr compensators; Thick films;
Conference_Titel :
Microelectronics, 2008. MIEL 2008. 26th International Conference on
Conference_Location :
Nis
Print_ISBN :
978-1-4244-1881-7
Electronic_ISBN :
978-1-4244-1882-4
DOI :
10.1109/ICMEL.2008.4559350
