DocumentCode :
2060618
Title :
The use of strain compensation layers in the growth of stacked quantum dot structures
Author :
Lever, P. ; Stewart, K. ; Fu, L. ; Tan, H.H. ; Jagadish, C.
Author_Institution :
Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT, Australia
Volume :
2
fYear :
2003
fDate :
12-14 Aug. 2003
Firstpage :
848
Abstract :
Stacked quantum dot structures with a large number of layers are difficult to fabricate due to the large amount of strain in the dot layers. Dislocations can form from the large degree of strain, also a large amount of interdiffusion occurs during annealing. By inserting thin layers of GaP in the barriers of stacked dot structures the overall strain in the layers is reduced. These structures have an increased photoluminescence intensity. There is also a small blueshift in the photoluminescence of these structures, and a large narrowing of the luminescence linewidth. The structures with GaP strain compensation are shown to be more thermally stable.
Keywords :
III-V semiconductors; MOCVD; annealing; dislocation structure; gallium compounds; photoluminescence; semiconductor growth; semiconductor quantum dots; semiconductor thin films; spectral line shift; stress effects; thermal diffusion; thermal stability; GaP; GaP thin layers; annealing; blueshift; dislocations; interdiffusion; luminescence linewidth; photoluminescence intensity; stacked quantum dot structures; strain compensation layers; thermal stability; Annealing; Capacitive sensors; Gallium arsenide; Infrared detectors; Luminescence; Photodetectors; Quantum dot lasers; Quantum dots; Temperature; US Department of Transportation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN :
0-7803-7976-4
Type :
conf
DOI :
10.1109/NANO.2003.1231047
Filename :
1231047
Link To Document :
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