Title :
Study of 15µm pitch solder microbumps for 3D IC integration
Author :
Yu, Aibin ; Lau, John H. ; Ho, Soon Wee ; Kumar, Aditya ; Hnin, Wai Yin ; Yu, Da-Quan ; Jong, Ming Ching ; Kripesh, Vaidyanathan ; Pinjala, Damaruganath ; Kwong, Dim-Lee
Author_Institution :
Inst. of Microelectron., Agency for Sci., Technol. & Res., Singapore
Abstract :
Developments of ultra fine pitch and high density solder microbumps and assembly process for low cost 3D stacking technologies are discussed in this paper. The solder microbumps developed in this work consist of Cu and Sn, which are electroplated in sequential with total thickness of 10 mum; The under bump metallurgy (UBM) pads used here is electroless plated nickel and immersion gold (ENIG) with thickness of 2 mum. Accordingly, joining of the two Si chips can be conducted by joining CuSn solder microbumps to ENIG UBM pads or CuSn solder microbumps to CuSn solder microbumps. The first joining can only be done with chip to chip assembly whereas the second joining has the potential for chip to wafer assembly. Assembly of the Si chips is conducted with the FC150 flip chip bonder at different temperatures, times, and pressures and the optimized bonding conditions are obtained. After assembly, underfill process is carried out to fill the gap and a void free underfilling is achieved using an underfill material with fine filler size.
Keywords :
copper alloys; electroless deposition; electroplating; joining processes; solders; stacking; tin alloys; 3D IC integration; 3D stacking technology; FC150 flip chip bonder; Si chips; bump metallurgy pads; electroless plated nickel; electroplating; fine filler size; immersion gold; optimized bonding conditions; pitch solder microbumps; size 2 mum to 15 mum; void free; wafer assembly; Assembly; Costs; Flip chip; Gold; Nickel; Stacking; Temperature; Three-dimensional integrated circuits; Tin; Wafer bonding;
Conference_Titel :
Electronic Components and Technology Conference, 2009. ECTC 2009. 59th
Conference_Location :
San Diego, CA
Print_ISBN :
978-1-4244-4475-5
Electronic_ISBN :
0569-5503
DOI :
10.1109/ECTC.2009.5073988