Stability analysis of double EWMA run-to-run control with metrology delay

Author

Good, Richard ; Qin, S. Joe

Author_Institution

Dept. of Chem. Eng., Texas Univ., Austin, TX, USA

Volume

3

fYear

2002

fDate

2002

Firstpage

2156

Abstract

The double exponentially weighted moving average (d-EWMA) feedback controller is a popular algorithm for controlling semiconductor manufacturing processes which have a deterministic drift. Like all controllers, a poorly tuned d-EWMA controller can result in system instabilities. This paper examines stability bounds for the tuning parameters of both single input-single output (SISO) and multiple input-multiple output (MIMO) d-EWMA controllers when there is plant-model mismatch and delay between product manufacturing and product metrology. In addition, a simulation of chemical mechanical planarization run-to-run (R2R) control is included to illustrate the importance of performing stability analysis in choosing d-EWMA tuning parameters.

Keywords

MIMO systems; batch processing (industrial); control system analysis; delays; feedback; integrated circuit manufacture; moving average processes; multivariable control systems; production control; stability; MIMO controllers; R2R control; SISO controllers; chemical mechanical planarization run-to-run control; d-EWMA feedback controller; deterministic drift; double EWMA run-to-run control; double exponentially weighted moving average feedback controller; metrology delay; plant-model delay; plant-model mismatch; product manufacturing; product metrology; semiconductor manufacturing process control; stability analysis; stability bounds; system instabilities; Adaptive control; Analytical models; Control systems; Delay; MIMO; Manufacturing processes; Metrology; Process control; Pulp manufacturing; Stability analysis;

fLanguage

English

Publisher

ieee

Conference_Titel

American Control Conference, 2002. Proceedings of the 2002

ISSN

0743-1619

Print_ISBN

0-7803-7298-0

Type

conf

DOI

10.1109/ACC.2002.1023956

Filename

1023956