DocumentCode :
2068421
Title :
High-flux capillary based XUV source via the direct engineering of a laser induced ionization profile
Author :
Anderson, Patrick N. ; Butcher, Thomas J. ; Horak, Peter ; Frey, Jeremy G. ; Brocklesby, William S.
Author_Institution :
Optoelectron. Res. Centre, Univ. of Southampton, Southampton, UK
fYear :
2011
fDate :
22-26 May 2011
Firstpage :
1
Lastpage :
1
Abstract :
In this work we have used computational modelling to optimize our original capillary design in an effort to minimize the absorption of the generated XUV. Subsequent experimental work has shown a flux increase of almost 50 times over our existing capillary-based source, regardless of the maximum gas pressure.
Keywords :
capillarity; light absorption; light sources; optical design techniques; optical harmonic generation; photoionisation; XUV absorption; XUV source; computational modelling; gas pressure; high harmonic generation; high-flux capillary; laser induced ionization profile;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Europe (CLEO EUROPE/EQEC), 2011 Conference on and 12th European Quantum Electronics Conference
Conference_Location :
Munich
ISSN :
Pending
Print_ISBN :
978-1-4577-0533-5
Electronic_ISBN :
Pending
Type :
conf
DOI :
10.1109/CLEOE.2011.5943040
Filename :
5943040
Link To Document :
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