DocumentCode :
2069676
Title :
Three-dimensional on-chip inductor design based on through-silicon vias
Author :
Feng Liang ; Si-Qi Zhao ; Aobo Chen ; Gaofeng Wang
Author_Institution :
Inst. of Appl. Phys., Univ. of Electron. Sci. & Technol. of China, Chengdu, China
fYear :
2013
fDate :
28-31 Oct. 2013
Firstpage :
1
Lastpage :
3
Abstract :
In this paper two kinds of three-dimensional (3D) on-chip inductor structures based on through-silicon vias (TSVs) are presented, which are quite suitable for applications in 3D integrated circuits. Their electromagnetic characteristics are analyzed by full-wave electromagnetic simulations and compared to those of planar spiral inductors. The results reveal that the 3D inductors based on TSVs have much smaller area as compared to the planar spiral inductors with the same inductance.
Keywords :
inductors; three-dimensional integrated circuits; 3D integrated circuits; 3D on-chip inductor design; full wave electromagnetic simulations; planar spiral inductors; through silicon vias; Inductance; Inductors; Spirals; Substrates; System-on-chip; Three-dimensional displays; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
ASIC (ASICON), 2013 IEEE 10th International Conference on
Conference_Location :
Shenzhen
ISSN :
2162-7541
Print_ISBN :
978-1-4673-6415-7
Type :
conf
DOI :
10.1109/ASICON.2013.6812066
Filename :
6812066
Link To Document :
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