DocumentCode :
2070756
Title :
The impacts of dimensions and return current path geometry on coupling in single ended Through Silicon Vias
Author :
Curran, Brian ; Ndip, Ivan ; Guttovski, Stephan ; Reichl, Herbert
Author_Institution :
Fraunhofer Inst. for Reliability & Microintegration, Berlin
fYear :
2009
fDate :
26-29 May 2009
Firstpage :
1092
Lastpage :
1097
Abstract :
Through Silicon Vias (TSVs) are expected to play an increasingly important role in next-generation microelectronics packaging. Even when the challenge of attenuation is overcome, crosstalk remains a major concern in TSV design. In this paper, it is shown that, at frequencies above 20 GHz, near-end crosstalk can easily exceed -20 dB. Traditional analytical models for crosstalk are compared to full-wave simulations to determine their limitations and a lumped element equivalent circuit model is presented. An examination of the impact of TSV dimensions is presented. Then, three TSV structures are compared and the impact of their dimensions on crosstalk is investigated.
Keywords :
electronics packaging; elemental semiconductors; equivalent circuits; integrated circuit modelling; integrated circuit packaging; silicon; Si; lumped element equivalent circuit model; near-end crosstalk; next-generation microelectronics packaging; single ended through silicon vias; Analytical models; Attenuation; Circuit simulation; Crosstalk; Frequency; Geometry; Microelectronics; Packaging; Silicon; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 2009. ECTC 2009. 59th
Conference_Location :
San Diego, CA
ISSN :
0569-5503
Print_ISBN :
978-1-4244-4475-5
Electronic_ISBN :
0569-5503
Type :
conf
DOI :
10.1109/ECTC.2009.5074148
Filename :
5074148
Link To Document :
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