DocumentCode
2071285
Title
A study of stacking limit and scaling in 3D ICs: an interconnect perspective
Author
Healy, Michael B. ; Lim, Sung Kyu
Author_Institution
Schoold of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA
fYear
2009
fDate
26-29 May 2009
Firstpage
1213
Lastpage
1220
Abstract
An examination of large-scale stacking of 3D integrated ICs from a power-supply and thermal reliability perspective is presented. Noise characteristics and scaling issues related to through-silicon-via (TSV) size and pitch as well as other power-supply topology characteristics are included. Thermal simulations are carried out assuming the use of micro-fluidic heatsinks to provide cooling to systems with power dissipation of up to 525 watts and 46 integrated silicon tiers. Results indicate that these large systems are feasible given sufficient planning. Power-delivery-bump pitch is identified as the most important factor influencing IR-drop and dynamic noise. Contact resistance also may become a major limiting factor.
Keywords
cooling; heat sinks; integrated circuit interconnections; integrated circuit noise; microfluidics; thermal analysis; 3D integrated IC interconnection; dynamic noise; integrated silicon tier; large-scale stacking; microfluidic heatsink; power-delivery-bump pitch; thermal reliability; through-silicon-via size; Cooling; Heat sinks; Large scale integration; Power dissipation; Power system planning; Power system reliability; Silicon; Stacking; Through-silicon vias; Topology;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2009. ECTC 2009. 59th
Conference_Location
San Diego, CA
ISSN
0569-5503
Print_ISBN
978-1-4244-4475-5
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2009.5074166
Filename
5074166
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