Title :
A study of TiO2, BaO and SrO thin films deposited by electrostatic spray assisted MOCVD
Author :
Lee, Young-Seop ; Park, Yong-Gyun ; Lee, Tae-Soo ; Lee, Sung-Jae ; Cho, Tong-Yul ; Chun, Hui Gon
Author_Institution :
Sch. of Mater. Sci. & Metall. Eng., Ulsan Univ., South Korea
fDate :
26 Jun-3 Jul 2001
Abstract :
In this study, the electrostatic spray assisted ESA-MOCVD is found to have the advantages of simple apparatus without gas lines, easy control of nano-sized droplets by applied voltage and solution rates, and easy control of thin film compositions by controlling the starting solution composition. The effect of deposition parameters on the growth behavior of TiO2 thin films such as substrate temperature, deposition time, applied voltage, oxygen rates, and annealing effect were investigated. The microstructure, composition and roughness were characterized by SEM, XPS and AFM, respectively. XRD was used to determine crystallization. Finally, we found how to adjust to deposit BaO and SrO thin films by ESA-MOCVD
Keywords :
MOCVD; X-ray diffraction; X-ray photoelectron spectra; annealing; atomic force microscopy; barium compounds; crystallisation; drops; scanning electron microscopy; spray coating techniques; strontium compounds; surface topography; titanium compounds; vapour phase epitaxial growth; AFM; BaO; BaO thin films; ESA-MOCVD; O2; SEM; SrO; SrO thin films; TiO2; TiO2 thin films; XPS; XRD; annealing effect; applied voltage; crystallization; deposition parameter effects; deposition time; electrostatic spray assisted MOCVD; gas lines; growth behavior; nano-sized droplets; oxygen rates; solution rates; substrate temperature; surface composition; surface microstructure; surface roughness; thin film compositions; Annealing; Electrostatics; Microstructure; Spraying; Sputtering; Substrates; Temperature; Transistors; Voltage control; X-ray scattering;
Conference_Titel :
Science and Technology, 2001. KORUS '01. Proceedings. The Fifth Russian-Korean International Symposium on
Conference_Location :
Tomsk
Print_ISBN :
0-7803-7008-2
DOI :
10.1109/KORUS.2001.975016
