• DocumentCode
    2073194
  • Title

    A micromachined V-band CMOS bandpass filter with 2-dB insertion-loss

  • Author

    Chang, Jin-Fa ; Lin, Yo-Sheng ; Huang, Pen-Li ; Lu, Shey-Shi

  • Author_Institution
    Dept. of Electr. Eng., Nat. Chi Nan Univ., Puli
  • fYear
    2009
  • fDate
    26-29 May 2009
  • Firstpage
    1590
  • Lastpage
    1593
  • Abstract
    A low-insertion-loss V-band CMOS bandpass filter is demonstrated. The proposed filter architecture has the following feature: the low-frequency transmission-zero (omegaz1) and the high-frequency transmission-zero (omegaz2) can be tuned by the series-feedback capacitor Cs and the parallel-feedback capacitor Cp, respectively. To reduce the substrate loss, the CMOS process compatible backside inductively-coupledplasma (ICP) deep trench technology is used to selectively remove the silicon underneath the filter. After the ICP etching, this filter achieved insertion-loss (1/S21) lower than 3 dB over the frequency range of 52.5-76.8 GHz. The minimum insertion-loss was 2 dB at 63.5 GHz. To the authors´ knowledge, this is the best result ever reported for a V-band CMOS bandpass filter in the literature.
  • Keywords
    CMOS integrated circuits; band-pass filters; capacitors; circuit tuning; micromachining; millimetre wave filters; sputter etching; ICP etching; frequency 52.5 GHz to 76.80 GHz; inductively-coupled plasma deep trench technology; loss 2 dB; micromachined V-band CMOS bandpass filter; parallel-feedback capacitor; series-feedback capacitor; Band pass filters; CMOS process; CMOS technology; Capacitors; Coupling circuits; Filtering theory; Mutual coupling; Passband; Resonator filters; Silicon; CMOS; V-band; bandpass filter; insertion loss; micromachined;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 2009. ECTC 2009. 59th
  • Conference_Location
    San Diego, CA
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4244-4475-5
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2009.5074226
  • Filename
    5074226