DocumentCode :
2073194
Title :
A micromachined V-band CMOS bandpass filter with 2-dB insertion-loss
Author :
Chang, Jin-Fa ; Lin, Yo-Sheng ; Huang, Pen-Li ; Lu, Shey-Shi
Author_Institution :
Dept. of Electr. Eng., Nat. Chi Nan Univ., Puli
fYear :
2009
fDate :
26-29 May 2009
Firstpage :
1590
Lastpage :
1593
Abstract :
A low-insertion-loss V-band CMOS bandpass filter is demonstrated. The proposed filter architecture has the following feature: the low-frequency transmission-zero (omegaz1) and the high-frequency transmission-zero (omegaz2) can be tuned by the series-feedback capacitor Cs and the parallel-feedback capacitor Cp, respectively. To reduce the substrate loss, the CMOS process compatible backside inductively-coupledplasma (ICP) deep trench technology is used to selectively remove the silicon underneath the filter. After the ICP etching, this filter achieved insertion-loss (1/S21) lower than 3 dB over the frequency range of 52.5-76.8 GHz. The minimum insertion-loss was 2 dB at 63.5 GHz. To the authors´ knowledge, this is the best result ever reported for a V-band CMOS bandpass filter in the literature.
Keywords :
CMOS integrated circuits; band-pass filters; capacitors; circuit tuning; micromachining; millimetre wave filters; sputter etching; ICP etching; frequency 52.5 GHz to 76.80 GHz; inductively-coupled plasma deep trench technology; loss 2 dB; micromachined V-band CMOS bandpass filter; parallel-feedback capacitor; series-feedback capacitor; Band pass filters; CMOS process; CMOS technology; Capacitors; Coupling circuits; Filtering theory; Mutual coupling; Passband; Resonator filters; Silicon; CMOS; V-band; bandpass filter; insertion loss; micromachined;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 2009. ECTC 2009. 59th
Conference_Location :
San Diego, CA
ISSN :
0569-5503
Print_ISBN :
978-1-4244-4475-5
Electronic_ISBN :
0569-5503
Type :
conf
DOI :
10.1109/ECTC.2009.5074226
Filename :
5074226
Link To Document :
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