• DocumentCode
    2073865
  • Title

    Optical detection of nanotweezers´ actuation

  • Author

    Meyer, Christine ; Lorenz, Heribert ; Karrai, Khaled

  • Author_Institution
    Center for Nanosci. & Sekt. Phys., Ludwig-Maximilians-Univ., Munich, Germany
  • Volume
    1
  • fYear
    2003
  • fDate
    12-14 Aug. 2003
  • Firstpage
    291
  • Abstract
    Silicon tweezers consisting of free-standing nanometer-sized prongs are investigated. These nanotweezers are fabricated using electron beam lithography as well as dry and wet etching processes. Due to electrostatic forces, they are deflected under a bias voltage applied to the prongs. An optical method to demonstrate the functionality under quasi-static conditions is presented. We discuss the demodulated signals measured at the 1st to 3rd harmonics, analyzing the amplitudes and phases. Comparison with a simple optical model leads to a quite good understanding of our experimental results. This technique should be easy to transfer to other NEMS.
  • Keywords
    actuators; electron beam lithography; elemental semiconductors; etching; nanopositioning; optical microscopy; scanning probe microscopy; silicon; NEMS; amplitudes; bias voltage; demodulated signals; electron beam lithography; electrostatic forces; etching; free standing nanometer sized prongs; harmonics; nanotweezers acutation; optical detection; optical method; phases; quasi static conditions; silicon tweezers; Electron beams; Electron optics; Electrostatic measurements; Harmonic analysis; Lithography; Optical detectors; Phase measurement; Silicon; Voltage; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
  • Print_ISBN
    0-7803-7976-4
  • Type

    conf

  • DOI
    10.1109/NANO.2003.1231775
  • Filename
    1231775