DocumentCode :
2074136
Title :
Direct integration of single-walled carbon nanotubes with silicon
Author :
Albrecht, P.M. ; Farrell, R.M. ; Ye, W. ; Lyding, J.W.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
Volume :
1
fYear :
2003
fDate :
12-14 Aug. 2003
Firstpage :
327
Abstract :
We have used ultrahigh vacuum scanning tunneling microscopy (UHV STM) to study single-walled carbon nanotubes (SWNTs) supported by a hydrogen-terminated Si(100)-2×1 surface. Two distinct methods were used in the deposition of SWNTs. The first is an ex situ solution-based scheme, while the second involves direct mechanical transfer in situ. The UHV-prepared Si(100)-2×1:H surface is highly robust to ambient exposure, resulting in minimal surface degradation associated with ex situ chemical processing. We have achieved simultaneous atomic resolution STM images of SWNTs and the nearby silicon substrate. Local electronic characterization was performed using scanning tunneling spectroscopy (STS). I-V spectra depict a shift in the Fermi energy of semiconducting SWNTs towards the valence band edge, consistent with charge transfer between the nanotube and the silicon substrate. A metallic SWNT shows an approximately linear I-V response at low bias, while the surrounding Si(100)-2×1:H substrate shows a ∼1.3 eV gap. An advanced understanding of the fundamental physical and electronic interactions between carbon nanotubes and silicon will further the development of hybrid nanoscale devices and circuits.
Keywords :
Fermi level; carbon nanotubes; elemental semiconductors; energy gap; scanning tunnelling microscopy; scanning tunnelling spectroscopy; semiconductor materials; silicon; valence bands; C-Si; Fermi energy; I-V spectra; SWNT; atomic resolution STM images; charge transfer; direct integration; electronic characterization; electronic interactions; ex situ chemical processing; hybrid circuits; hybrid nanoscale devices; hydrogen terminated Si(100) surface; in situ direct mechanical transfer; linear I-V response; metallic SWNT; scanning tunneling spectroscopy; semiconducting SWNT; silicon substrate; single walled carbon nanotubes; surface degradation; ultrahigh vacuum scanning tunneling microscopy; valence band edge; Atomic layer deposition; Carbon nanotubes; Chemical processes; Degradation; Energy resolution; Microscopy; Robustness; Silicon; Substrates; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on
Print_ISBN :
0-7803-7976-4
Type :
conf
DOI :
10.1109/NANO.2003.1231784
Filename :
1231784
Link To Document :
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