Grating fabrication in dielectric coatings by TWIN-LIBWE

The laser-induced backside wet etching (LIBWE) is one of the most promising and flexible and applicable indirect technique for micro- and submicrometer structuring of transparent dielectrics. It was recently demonstrated that the combination of LIBWE with the two-beam interferometric method (TWIN-LIBWE) is well suited for fabrication of submicrometer period gratings onto the surface of bulk fused silica. In this paper, the authors report on the fabrication of micrometer period grating structure in SiO₂, and ZrO₂ thin films with the use of TWIN-LIBWE.