Grating fabrication in dielectric coatings by TWIN-LIBWE

Author

Vass, C. ; Kiss, B. ; Sipos, Á ; Újhelyi, F. ; Dombi, P. ; Osvay, K.

Author_Institution

Dept. of Opt. & Quantum Electron., Univ. of Szeged, Szeged, Hungary

fYear

2011

fDate

22-26 May 2011

Firstpage

1

Lastpage

1

Abstract

The laser-induced backside wet etching (LIBWE) is one of the most promising and flexible and applicable indirect technique for micro- and submicrometer structuring of transparent dielectrics. It was recently demonstrated that the combination of LIBWE with the two-beam interferometric method (TWIN-LIBWE) is well suited for fabrication of submicrometer period gratings onto the surface of bulk fused silica. In this paper, the authors report on the fabrication of micrometer period grating structure in SiO₂, and ZrO₂ thin films with the use of TWIN-LIBWE.

Keywords

dielectric materials; diffraction gratings; laser materials processing; light interferometry; micro-optics; optical fabrication; optical films; silicon compounds; zirconium compounds; SiO₂; TWIN-LIBWE; ZrO₂; dielectric coatings; grating fabrication; indirect technique micrometer structuring; laser induced backside wet etching; micrometer period grating; two beam interferometric method; Dielectrics; Fabrication; Gratings; Laser beams; Silicon compounds; Substrates; Surface treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Europe (CLEO EUROPE/EQEC), 2011 Conference on and 12th European Quantum Electronics Conference

Conference_Location

Munich

ISSN

Pending

Print_ISBN

978-1-4577-0533-5

Electronic_ISBN

Pending

Type

conf

DOI

10.1109/CLEOE.2011.5943349

Filename

5943349