Title : 
Production solution for metallization of microelectronics - UBM of semiconductor devices and electrode of SAW filter devices
         
        
            Author : 
Park, Yeong-ho ; Kim, Jong-seok ; Shim, Kyu-cheol ; Gil, Tae-hyun ; Lee, Eune-jik ; Chun, Huigon
         
        
            Author_Institution : 
Res. & Dev. Center, SUNIC Syst. Ltd, Suwon, South Korea
         
        
        
        
            fDate : 
26 Jun-3 Jul 2001
         
        
        
            Abstract : 
While evaporation technology was used for many years in the metallization of microelectronic devices, the current state-of-the-art manufacturing system for metallization is sputtering systems with high throughput. To provide ideal mass-production solutions, SUNIC continually has optimized and extended the SUNICOAT series. In this paper, we introduce several sputtering systems among the SUNICOAT series with production solutions for metallization of microelectronics, especially UBM and SAW filter. SUNIC has developed and supplied SUNICOAT IS-3000 with high throughput and reliability for UBM process and SUNICOAT 4000 with below 1% uniformity for SAW filter devices. Furthermore, SUNICOAT 4000V with below 0.5% uniformity is being developed
         
        
            Keywords : 
chip scale packaging; electrodes; flip-chip devices; semiconductor device packaging; sputter deposition; surface acoustic wave filters; SAW filter; SUNICOAT 4000; SUNICOAT 4000V; SUNICOAT IS-3000; SUNICOAT series; UBM; electrode; flip chip technology; mass-production solutions; semiconductor devices; sputtering systems; throughput; under bump metallization; Electrodes; Metallization; Microelectronics; Production; SAW filters; Semiconductor device packaging; Semiconductor devices; Sputtering; Surface acoustic waves; Throughput;
         
        
        
        
            Conference_Titel : 
Science and Technology, 2001. KORUS '01. Proceedings. The Fifth Russian-Korean International Symposium on
         
        
            Conference_Location : 
Tomsk
         
        
            Print_ISBN : 
0-7803-7008-2
         
        
        
            DOI : 
10.1109/KORUS.2001.975256