Title :
IEE Colloquium on `Applications of Plasma Technology to Surface Processing - Recent Developments in Modelling and Diagnostics for Process Control and Optimization´ (Digest No.1995/149)
Abstract :
The following topics were dealt with: plasma modelling; afterglow plasmas; intense plasma source discharges; plasma CVD modelling and characterization; glow discharge modelling; RF reactor control diagnostics; dusty plasmas
Keywords :
afterglows; glow discharges; plasma applications; plasma deposition; plasma diagnostics; plasma theory; process control; surface treatment; RF reactor control diagnostics; afterglow plasmas; dusty plasmas; glow discharge modelling; intense plasma source discharges; optimization; plasma CVD modelling; plasma characterization; plasma modelling; process control; surface processing;
Conference_Titel :
Application of Plasma Technology to Surface Processing - Recent Developments in Modelling and Diagnostics for Process Control and Optimization, IEE Colloquium on
Conference_Location :
London
